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IMPRINT RESIST AND SUBSTRATE PRETREATMENT FOR REDUCING FILL TIME IN NANOIMPRINT LITHOGRAPHY

Facilitating throughput in nanoimprint lithography processes by using an imprint resist including fluorinated components and a substrate treated with a pretreatment composition to promote spreading of an imprint resist on the substrate. The interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air by at least 1 mN/m, and the contact angle of the imprint resist on the surface of the nanoimprint lithography template is less than 15.


» Number: WO2017172791A1 (A1)

» Publication Date: 17//2/05/1

» Applicant: CANON KK?[JP]; CANON NANOTECHNOLOGIES INC?[US]

» Inventor: LIU WEIJUN?[US]; STACHOWIAK TIMOTHY BRIAN?[US] (2)

» More Information

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This project has received funding from the European Union Seventh Framework Programme (FP7/2007-2013) under grant agreement n [310187].