Technological

Watch

Powered by:

PATENT

SYSTEM AND METHODS FOR NANOIMPRINT LITHOGRAPHY

An imprint lithography system that pressurizes and depressurizes an air cavity behind a retained imprint template or substrate so as to deflect the template or substrate to aid in filling the template pattern with fluid resist and/or separating the template from the cured resist on the substrate. The system includes a controller, pressure sensors, and an impedance valve for modulating the air cavity pressure so as to reduce pressure wave oscillations within the cavity that otherwise negatively impact overlay accuracy control, fluid spread control and separation control.


» Number: US2017282439A1 (A1)

» Publication Date: 17//2/05/1

» Applicant: CANON KK?[JP]

» Inventor: LU XIAOMING?[US]; SCHUMAKER PHILIP D?[US] (1)

» More Information

« Go to Technological Watch

LATEST NEWS TECHNOLOGICAL WATCH

[19/10/2017] - Carbon Fibre Specialists Custom Composites Team Up with Olympic Hopefuls

[19/10/2017] - WhatsApp Use by Argentina Ambulances Associated with Faster Heart Attack Treatment

[19/10/2017] - Pheromones Market in Agriculture - Global Forecast to 2022 - By Crop Type, Application, Mode of Application, Type & Region - Research and Markets

[19/10/2017] - Molecular Biology Enzymes and Kits & Reagents Market - Global Forecast to 2022 - Research and Markets

This project has received funding from the European Union Seventh Framework Programme (FP7/2007-2013) under grant agreement n [310187].